Reference Report for IND21804538
| Title: | Soybean genetic resistance and benomyl for phomopsis seed decay control. |
| Authors: | Elmore, R.W., Minor, H.C., Doupnik, B.L. Jr. |
| Source: | Seed technol. 1998, 20(1):23-31 |
| Abstract: | Phomopsis seed decay (PSV) is the seed infection phase of an important soybean [Glycine max (L.) Merr.] disease complex and is caused by several species of Phomopsis and Diaporthe. The complex (which also includes pod and stem blight and stem canker) reduces seed quality in all major soybean growing areas of the world. Farmers use cultural and chemical methods to partially control PSD. Genetic resistance is an important defense against plant disease and an important alternative to chemical control. Widely grown cultivars with genetic resistance to PSD are not available; however, resistance to PSD from a plant introduction (PI 417479) is now incorporated into an improved breeding line. The objective of this study was to ascertain the relative effectiveness of genetic resistance and fungicide application (benomyl) for the control of PSD. Six lines from crosses with PI 417479 were compared to two cultivars and PI 417479 at Missouri (MO) and Nebraska (NE) in 1989 and 1990. Benomyl reduced PSD by 55% at MO. The PSD resistant line had 1.3% and 3.3% PSD with and without benomyl, respectively, at MO; whereas PSD of the moderately resistant cultivar, 'Williams 82', was 5.3% and 18.0%, respectively. In environments favoring high PSD levels like those encountered in MO, lines resistant to PSD can provide effective control without fungicide application. In these same environments fungicide application is necessary to reduce PSD in susceptible and moderately resistant lines. Incorporating PSD resistance into cultivars with high yield potential may enhance soybean profitability by reducing the need for chemical control. |
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